BM-405

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BM-405

MOQ

1pz

Produktaj Detaloj:

Introduction:
BM-405 industrial microscope is equipped with a large moving range mechanical stage, Epi-illuminator, long working distance bright and dark field Infinite Plan objectives, wide-field eyepiece with clear images and good contrast. It is developed and aimed at the semiconductor industry, wafer manufacturing, electronic information industry, metallurgical industry, and used as a high-grade industrial microscope. Bright £¦ Darkfield observation, EPI-polarizing, and DIC observation can proceed. It is widely used in Factories, Research institutions and colleges, and Universities to identify and analyze Wafer, FPD, Circuit substrate, Precision molds.
Specifo
Vidante Kapon
Kompenso Senpaga Trinokula Kapo, Inclined 30°£¨50mm-75mm£©
Okularo
WF10×/25mm
WF10×/20mm,kruchalo kun retikulo 0.1mm
Nazpeco
Kvinopla Nazpeco kun DIC Jack
Objektivo
Longa labordistanco helaj kaj malhelaj kampoj Senfina Plano-celoj:
5 ×/0.1B.D/W.D.29.4mm 10×/0.25B.D/W.D.16mm 20×/0.40B.D/W.D.10.6mm 40
×/0.60B.D/W.D.5.4mm
Scenejo
Duobla tavola mekanika stadio
Scena Grandeco: 350mm × 310mm
Movanta Gamo:250mm × 250mm
Filtrilo
Flashboard tipo filtriloj(verda,blua,neŭtrala)
Fokuso
Coaxial coarse fine focusing adjustment With rack and pinion mechanism Fine
fokusa skalvaloro 0.002mm
Lumo Fonto
Epi-lumigado: Kun aperturo irisa diafragmo kaj kampa iriso Diafragmo, Halogeno
Ampolo 12V/100W, AC85V-230V, Heleco Alĝustigebla
Polarizanta Aparato
Analyzer rotatable 360,°Polariaer Analyzer can be moved in/out of the optical path
Kontrolanta Ilo
0.01mm Mikrometro
Laŭvola Akcesoraĵo
Okularo: WF15×/17mm WF20×/12.5mm
1.3Mega 2.0 Mega 3.0 Mega 5.0 Megapikseloj CMOS Cifereca fotila okulario
Longa labordistanco helaj kaj malhelaj kampoj Senfina Plano-celoj: 50
×/0.55B.D/W.D.5.1mm 80×/0.75B.D/W.D.4mm 100×/0.80B.D/W.D.3mm
Dudimensia mezura programaro
Profesia metalurgia bilda analiza programaro
DIC 10× 20× 40× 100×
Photography attachment and CCD Adapter 0.5× 0.57× 0.75×
Plana ilo
CCD Fotilo,koloro 1/3″ Alta rezolucio 520 Televidlinioj
Characteristics and description
1. Adopt UIS High-resolution, Long working distance, and infinity light path
correcting system objective imaging technology
2. Extending the multiplexing technology of objective, compatible infinity objective with all the observation methods. including bright £¦ darkfield observation, polarization and also provide with the high clear and sharp image in each observation method.
3. Aspherical surface Kohler illumination, increasing the viewing brightness.
4. WF10 X£¨Φ25£©super wide field Eyepiece, long working distance
metallurgical objective with bright and dark field
5. The Nosepiece can be equipped with a detachable DIC differential interference device.

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Enketo: BM-405

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